DEVELOPMENT OF THE DESIGN ENVIRONMENT AND ASSESSMENT OF THE MANUFACTURABILITY OF THE CHIP PRODUCTION TAKING INTO ACCOUNT THE RESISTANCE TO SPECIAL FACTORS ON THE EXAMPLE OF VLSI 1867VTS6F

Sklyar V.; Smerek V.; Zolnikov Konstantin Vladimirovich; Chernov D.; Yagodkin A. Sergeevich

doi:doi:10.12737/2219-0767-2020-13-1-77-82

DEVELOPMENT OF THE DESIGN ENVIRONMENT AND ASSESSMENT OF THE MANUFACTURABILITY OF THE CHIP PRODUCTION TAKING INTO ACCOUNT THE RESISTANCE TO SPECIAL FACTORS ON THE EXAMPLE OF VLSI 1867VTS6F

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DEVELOPMENT OF THE DESIGN ENVIRONMENT AND ASSESSMENT OF THE MANUFACTURABILITY OF THE CHIP PRODUCTION TAKING INTO ACCOUNT THE RESISTANCE TO SPECIAL FACTORS ON THE EXAMPLE OF VLSI 1867VTS6F

Journal: MODELING OF SYSTEMS AND PROCESSES Volume 13 № 1 , 2020

Rubrics: TEHNICHESKIE NAUKI

UDK 60 Прикладные науки. Общие вопросы

Sklyar V. ¹

Smerek V. ²

Zolnikov Konstantin Vladimirovich ³

Chernov D. ⁴

Yagodkin A. Sergeevich ⁵

Author and publication information

Authors:

1. AO "Nauchno-issledovatel'skiy institut elektronnoy tehniki"

2. AO "Nauchno-issledovatel'skiy institut elektronnoy tehniki"

3. AO "Nauchno-issledovatel'skiy institut elektronnoy tehniki"

Russian Federation

4. Scientific research institute electronic engineering

Voronezh State Technical University

Russian Federation

5. Voronezh State University of Forestry and Technologies named after G.F. Morozov

Russian Federation

Type:

Article

DOI:

https://doi.org/10.12737/2219-0767-2020-13-1-77-82

Pages:

from 77 to 82

Status:

Published

Received:

26.05.2020

Accepted:

26.05.2020

Published:

26.05.2020

Subject area:

UDK 60 Прикладные науки. Общие вопросы

Language:

Russian

Keywords:

VLSI 1867VC6F, special factors, processability of production, design, design route, microelectronics, special factors.

Abstract and keywords

Abstract (English):
The article is devoted to the process of creating digital microelectronic devices that meet certain parameters, including the requirements for resistance to special factors. The technological environment for designing the 1867vc6f product and the design route are described. The created design technology provided the development of a radiation-resistant chip. The assessment of the product's production manufacturability and the level of standardization and unification was carried out.

Keywords:
VLSI 1867VC6F, special factors, processability of production, design, design route, microelectronics, special factors.

References

1. Metody shemotehnicheskogo modelirovaniya KMOP SBIS s uchetom radiacii / K.V. Zol'nikov, V.A. Sklyar, V.I. Anciferova, S.A. Evdokimova // Voprosy atomnoy nauki i tehniki. Seriya: Fizika radiacionnogo vozdeystviya na radioelektronnuyu apparaturu. - 2014. - № 2. - S. 5-9.

2. Shemotehnicheskiy bazis i proverka mikroshem na rabotosposobnost' / V.K. Zol'nikov, S.A. Evdokimova, A.V. Fomichev, V.N. Chikin, A.V. Achkasov, V.F. Zinchenko // Modelirovanie sistem i processov. - 2018. -T. 11, № 4. - S. 25-30.

3. Rezul'taty issledovaniya sboeustoychevogo processora serii 1867 / A.I. Yan'kov, A.V. Achkasov, K.V. Zol'nikov, M.V. Konarev, N.A. Orlikovskiy // Modelirovanie sistem i processov. - 2013. - № 4. - S. 72-74.

4. Raschet pokazateley stoykosti raboty cifrovyh mikroshem v SAPR / V.K. Zol'nikov, V.V. Lavlinskiy, Yu.A. Chevychelov, Yu.S. Serbulov, V.I. Anciferova, V.N. Achkasov, Yu.G. Tabakov // Lesotehnicheskiy zhurnal. - 2014. - T. 4, № 4 (16). - S. 291-301.

5. Algoritmicheskaya osnova modelirovaniya i obespecheniya zaschity tipovyh KMOP elementov v processe proektirovaniya / V. K. Zol'nikov, V. A. Smerek, V. I. Anciferova, S. A. Evdokimova // Modelirovanie sistem i processov. - 2013. - № 3. - S. 14-16.

6. Metody obespecheniya stoykosti mikroshem k odinochnym sobytiyam pri proektirovanii radiacionno-stoykih mikroshem / V. N. Achkasov, V. A. Smerek, D. M. Utkin, V. K. Zol'nikov // Problemy razrabotki perspektivnyh mikro- i nanoelektronnyh sistem (MES). - 2012. - № 1. - S. 634-637.

7. Smerek, V. K. Model' fizicheskih processov v elementah SBIS pri vozdeystvii tyazhelyh zaryazhennyh chastic / V. K. Smerek, V. K. Zol'nikov, K. I. Tapero // Modelirovanie sistem i processov. - 2010. - № 1-2. - S. 41-48.

8. Kryukov, V. P. Problemy modelirovaniya bazovyh elementov KMOP BIS dvoynogo naznacheniya v SAPR / V.P. Kryukov, K.V. Zol'nikov, S.A. Evdokimova // Modelirovanie sistem i processov. - 2013. - № 4. - S. 41-44.

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